Machine Learning Research Intern - ILT Model Development

Natcast (short for The National Center for the Advancement of Semiconductor Technology) is a new, purpose-built, non-profit entity created to operate the National Semiconductor Technology Center (NSTC) consortium, established by the CHIPS Act of the U.S. government.

Working at Natcast represents an opportunity to help extend America’s leadership in semiconductor technology, significantly reduce the time and cost of moving from idea to commercialization, and build and sustain a semiconductor workforce development ecosystem.

These efforts to advance semiconductor technology and seed new industries built on the capabilities of a wide range of advanced chips hold the potential to benefit the country and the world for generations to come.

In this role you will pioneer the application of advanced machine learning techniques to Inverse Lithography Technology (ILT), contributing directly to next-generation semiconductor manufacturing capabilities. 

Every day you will explore cutting-edge AI/ML approaches, analyze complex datasets, and collaborate with researchers to advance EUV lithography optimization. 

To thrive in this role you must combine deep machine learning expertise with scientific curiosity, demonstrating innovative thinking while conducting rigorous research analysis. 

Natcast stands at the forefront of semiconductor research and engineering, serving as a crucial hub for innovation in the U.S. semiconductor ecosystem. As a leading research institution, Natcast drives technological advancement through collaborative partnerships, cutting-edge facilities, and a commitment to maintaining U.S. leadership in semiconductor technology. 

This internship presents an exceptional opportunity to contribute to groundbreaking research in semiconductor manufacturing. The position focuses on evaluating and implementing machine learning approaches for ILT optimization, directly impacting the advancement of EUV lithography technology. 

Responsibilities: 

• Conduct comprehensive literature review of ML approaches for ILT 

• Evaluate methods including LithoGAN, DAMO, DOINN, and CFNO 

• Implement and compare approaches using open-source databases 

• Analyze performance using LithoBENCH and ICCAD-13 benchmarks 

• Apply selected models to EUV exposure data 

• Collaborate with research team on model optimization 

• Document research findings and methodologies 

• Present results to technical stakeholders 

Required Skills and Experience: 

• Currently pursuing PhD or Master's in Computer Science, Machine Learning, or related field 

• Strong background in deep learning and neural networks 

• Experience with Python and ML frameworks (PyTorch, TensorFlow) 

• Understanding of computer vision techniques 

• Excellent analytical and problem-solving skills 

• Strong scientific writing and presentation abilities 

• Ability to work independently on research projects 

Preferred Skills and Experience: 

• Previous research experience in semiconductor manufacturing 

• Experience in reticle enhancement technologies (RET)  

• Familiarity with lithography processes 

• Publication record in ML/AI 

• Experience with image processing 

• Knowledge of EUV technology 

Natcast is an equal opportunity employer. We do not discriminate based on race, color, religion, gender, gender expression, age, national origin, disability, marital status, sexual orientation, military status, or any protected attribute. We encourage qualified candidates from all backgrounds to apply and join us in our mission. If you require accommodation at any stage of the application process due to a disability, please let us know. 

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